Modeling decarburization kinetics of grain-oriented silicon steel

A mathematic model has been presented to predict the decarburization kinetics of grain-oriented silicon steel sheet in the gas mixture of N2–H2–H2O during annealing.This model is based on the carbon flux balance between the oxidation reaction at the surface and the carbon diffusion inside the steel sheet.It can be numerically solved to quantify the influences of annealing temperature and atmosphere on decarburization kinetics when the boundary conditions are properly determined.In case that a humid gas mixture is employed during annealing,the most influential process parameter is temperature rather than compositions of the gas mixture,because the diffusion of carbon in ferrite is the rate-limiting step.Therefore,a higher temperature is required for the efficient decarburization of the thicker silicon steel sheet using the industrial continuous annealing production line.     

氮掺杂碳化硅纳米管电子场发射的第一性原理研究

运用第一性原理研究了氮掺杂对碳化硅纳米管场发射性能影响.计算结果表明,在外加电场作用下,体系的态密度均向低能端移动,赝能隙及最高占据分子轨道/最低未占据分子轨道能隙减小,且Mulliken电荷在帽端聚集程度增加.态密度、最高占据分子轨道/最低未占据分子轨道能隙及Mulliken电荷分析表明,氮掺杂改善了碳化硅纳米管的场发射性能,且N替代顶层五元环中Si原子体系场发射性能最优.     

High-energy ion treatments of amorphous As40Se60 thin films for optical applic ations

The treatment of 100 MeV Ag swift-heavy ion(SHI) irradiation with five different fluences(3 1010, 1 1011, 3 1011, 1 1012, and3 1012ions/cm2) was used to design optical and structural properties of amorphous(a-) As40Se60 chalcogenide thin films. Swanepoel method was applied on transmission measurements to determine the changes in optical bandgap, Tauc parameter and linear optical parameters, i.e., linear optical absorption, extinction coefficient and linear refractive index. Dispersion of the material was determined by Wemple–DiDomenico relation.Changes in nonlinear optical parameters of third-order optical susceptibility and nonlinear refractive index were determined using semi-empirical relations. Changes in surface morphology of the films were investigated using SEM observation, which indicated that fluence 3 1012ions/cm2was upper threshold limit for these films for ion treatment. It is observed that optical bandgap reduces from 1.76 eV to 1.64 eV, and nonlinear refractive index increases from 1.31 10 10[esu] to 1.74 10 10[esu]. Linear refractive index initially increases from 2.80 to 3.52(for fluence3 1010ions/cm2) and then keeps decreasing. The observed changes in optical properties upon irradiation were explained in terms of structural rearrangements by Raman measurement. The study was compiled with the previous literature to propose SHI as an effective optical engineering technique to achieve desired changes according to the need of optical/photonic applications.     

硅片不同表面钝化工艺的稳定性研究

研究分析了热氧化钝化,用PECVD双面沉积SiNx:H膜钝化以及碘酒钝化三种表面钝化工艺的稳定性,通过WT-2000少子寿命测试仪对采用这三种钝化工艺的单晶硅片,多晶硅片以及物理提纯硅片在暗条件不同储存时间的少子寿命进行测量,分析得到三种表面钝化工艺的效果以及稳定性。研究结果表明:碘酒钝化效果好,用PECVD双面沉积SiNx:H膜钝化和热氧化钝化稳定性好。     

热处理温度对溶胶-凝胶法制备的Ce_(0.97)Co_(0.03)O_2薄膜结构和光学性能的影响

采用溶胶-凝胶法,在Si(100)衬底上制备了3%Co掺杂CeO2薄膜,研究了不同热处理温度对Ce0.97Co0.03O2薄膜结构和光学性质的影响。X射线衍射(XRD)表明,3%Co掺杂CeO2薄膜为多晶薄膜,且未破坏CeO2原有的结构,随着退火温度的升高,晶粒尺寸逐渐增大。椭偏光谱法研究表明,Ce0.97Co0.03O2薄膜的光学常数(折射率n、消光系数k)随着退火温度增加而增大,光学带隙Eg随退火温度增加而减小,这是薄膜结构随退火温度增加发生变化所致。     

Preparation of Electrospun CdSe-Quantum-Dots-Doped Porous Films

Electrospun porous films doped with the green-synthesized CdSe quantum dots were synthesized. Glycerol was chosen to prepare the quantum dots （ QDs）, with the highest quantum yield of 78.28%. Polycaprolactone （PCL） was electrospun with CdSe QDs to avoid the QDs＇ toxicity and improve the QDs＇ cytocompatibility. The electrospun QDs-doped films preserve the original QDs＇ fluorescence. Pores can be detected from the SEM of the films, predicting the possibility of loading drugs in the cancer therapy. The cell proliferation assay shows excellent cytocompatibility of the eletrospun CdSe-QDs-doped films. The present eletrospun CdSe- QDs-doped porous films are cytocompatibale, highly-fluorescent and ootential to load drugs in cancer therapy.     

高铁基硅混凝剂形成铅絮体的分形维数分析

利用高铁基硅混凝剂及聚磷硫酸铁(PPFS)对含铅工业废水进行处理,考察含铅工业废水处理过程中分形维数对铅絮体的影响以及与铅离子去除率的关系。结果表明:对于模拟的含铅工业废水,高铁基硅混凝剂的最佳投药量(体积分数)为3.5×10-3,最佳的pH值为9.5,在此最佳条件下,铅絮体的分形维数最大,铅絮体最为密实,铅离子的去除率也最高,分形维数与铅离子去除率之间有良好的相关性;对于实际含铅工业废水,高铁基硅混凝剂的最佳投量为8×10-3,除率为92.5%,效果要好于PPFS;两种混凝剂的分形维数与铅离子去除率之间同样有良好相关性。     

本征晶格缺陷对BNT铁电薄膜光响应性能的影响简

用溶胶-凝胶法在YSZ/Si衬底上制备Bi3．15 Nd0．85 Ti3 O12（BNT）铁电薄膜,研究了退火气氛和退火温度对BNT薄膜的光响应性能的影响。对不同退火气氛和退火温度下的BNT薄膜进行微观结构和光响应性能表征。研究结果表明：随着退火气氛中氧含量的降低,光响应增大,BNT薄膜中氧空位起到了为光生载流子传输提供通道的作用;随着退火温度的降低,光开启电压和饱和光电导增大,BNT薄膜中高密度的晶界虽然阻碍了光生载流子的迁移,却有利于使光生载流子在晶界处及时分开。     

微波辅助碳热还原法制备碳化硅粉体

基于碳热还原法制备碳化硅的原理,针对该方法合成成本高,反应时间长,所用设备昂贵,合成条件苛刻等缺陷．利用微波的良好加热性能,采用微波辅助碳热还原法制取碳化硅粉体．经实验表明,最优条件为：锌粉作催化剂,碳硅原子比为4：1,微波功率800W,微波时间30min．该方法制备的碳化硅为3C—SiC晶型,晶粒粒径相对较小．微波辅助碳热还原法具有成本低、产量大、反应时间短、尺寸相对较小,具有工业化应用的前景．     

基于FIB和TEM的纳米材料中界面分层破坏的实验方法研究与应用

本文针对三维尺寸均处于纳米量级的材料与结构中常见的界面分层破坏问题,利用聚焦离子束技术(FIB)和透射电子显微镜(TEM)开发设计了一套研究纳米材料中界面端部裂纹启裂行为的实验方法.采用FIB成功从宏观多层薄膜材料(硅/铜/氮化硅,Si/Cu/SiN)中切割制备出了由硅基体(Si)和200 nm厚铜薄膜(Cu)及1000 nm厚氮化硅层(SiN)构成的纳米悬臂梁试样.利用高精度微小材料加载装置,在TEM中对该试样进行加载实验,并原位观测了不同试样中Cu/Si界面端部裂纹启裂的行为.通过对启裂瞬时Cu/Si界面上临界应力分布的有限元分析发现,不同尺寸试样中的界面上法向应力与剪切应力均集中在距界面端部100 nm的范围内,且临界法向应力远大于剪切应力.对应力分布的进一步分析则发现,距界面端部5 nm区域内的法向应力场控制着Cu/Si界面的分层破坏过程,可用于表征界面分层破坏的局部控制准则.